anton-maksimov-5642-su-HoTybva3HQI-unsplash >

Procedimento in-silico di identificazione del design di un sensore plasmonico nanostrutturato

Processo in silico per identificare il design di un sensore plasmonico nanostrutturato

Abstract brevetto

An in silico process to identify a nanostructured plasmonic sensor design includes the following operational steps: selection of an analyte; characterization of the analyte using computational techniques; selection of at least one two- or three-dimensional nanostructured substrate with plasmonic characteristics; characterization of each substrate using computational techniques; and performing an interaction potential mapping between the analyte and each substrate so as to identify, for each region and/or each atom of each substrate, an interaction value with the analyte; calculating the spectral signal of the analyte adsorbed on each substrate for at least one region and/or one atom of each substrate; analytically evaluating an enhancement factor of each calculated spectral signal; and comparing each enhancement factor with a corresponding predefined minimum threshold value in order to assess whether the associated nanostructured plasmonic sensor is configured to perform analyte detection with single-molecule sensitivity.

Titolari

Scuola Normale Superiore di PISA

Inventori

Piero LAFIOSCA, Tommaso GIOVANNINI, Luca BONATTI, Luca NICOLI, Chiara CAPPELLI

Domanda di priorità

Numero deposito: IT202200017058
Data deposito: 28/04/2024

Status

Concesso

Famiglia brevettuale

Numero di deposito Data deposito Titolo Nazione deposito
WO2023IB57698 28-07-2023 IN SILICO PROCESS FOR IDENTIFYING THE DESIGN OF A NANOSTRUCTURED PLASMONIC SENSOR Mondiale

Area tematica

Chimica, fisica, nuovi materiali e processi di lavorazione